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Advanced Lithography

SPIE

Categories

Date of beginning

Sunday, 22 February 2015

Duration

5 days

Deadline for abstracts

Monday, 08 September 2014

City

San Jose Convention Center

Country

United States

Contact

Customer Service

E-Mail

This email address is being protected from spambots. You need JavaScript enabled to view it.

Website

http://spie.org/advanced-lithography.xml?WT.mc_id=RALCAW

Expected participants

2500

Participants

0

Memo

SPIE Advanced Lithography is the premier conference for the lithography community. For 40 years, SPIE has brought together this community to address challenges presented in fabricating next-generation integrated circuits.

SPIE Advanced Lithography draws more than 2,400 attendees, 60 exhibitors, and 600 technical papers representing the most talented researchers and managers working in the lithography industry. Leading experts offer courses that will keep you and your team current.

Featuring presentations on:

+ Extreme Ultraviolet (EUV) Lithography

+ Alternative Lithographic Technologies

+ Metrology, Inspection, and Process Control for Microlithography

+ Advances in Patterning Materials and Processes

+ Optical Microlithography

+ Design-Process-Technology Co-optimization for Manufacturability

+ Advanced Etch Technology for Nanopatterning